Triple layer hard mask for gate patterning to fabricate scaled CMOS transistorsByoung Hun Lee,Bachir Dirahoui,Effendi Leobandung, Taichi Sumag(2004)引用 35|浏览4AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要