A Study of Beol Resistance Mismatch in Double Patterning Process
2015 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE AND 2015 IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE (IITC/MAM)（2015）
Key words
BEOL resistance mismatch,double patterning process,matched circuit components,lithography-etch-lithography-etch process,back-end-of-line metal,metal resistance mismatch,mismatch variability,size 14 nm
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined