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A Novel Embedded Extension SiGe (e2SiGe) Process for PFET Performance Enhancement for 45nm Technology and beyond

L. W. Teo,H. Utomo, S. S. Tan, S. Y. Ong,C.W. Lai,Z. Luo,S.D. Kim,R. Stierstorfer,S. Mishra,H. Zhuang,C.W. Yap,Y. Zhang,J.-P. Han,R. Lipton,J. Li,G. Chiulli,J.C. Kim,B.F. Phoong,M. Eller, X. Wu,Y.M. Lee,N. Rovedo,R. Wise,H. Shang,H. Ng,J. Sudijono

Extended Abstracts of the 2007 International Conference on Solid State Devices and Materials（2007）

引用 22|浏览12
关键词
pfet performance enhancement,novel embedded extension sige,e2sige
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