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Commissioning an Euv Mask Microscope for Lithography Generations Reaching 8 Nm

Kenneth A. Goldberg,Iacopo Mochi,Markus Benk,Arnaud P. Allezy, Michael R. Dickinson,Carl W. Cork,Daniel Zehm,James B. Macdougall,Erik Anderson,Farhad Salmassi,Weilun L. Chao, Vamsi K. Vytla,Eric M. Gullikson,Jason C. DePonte,M. S. Gideon Jones, Douglas Van Camp, Jeffrey F. Gamsby, William B. Ghiorso, Hanjing Huang,William Cork, Elizabeth Martin,Eric Van Every,Eric Acome,Veljko Milanovic,Rene Delano,Patrick P. Naulleau,Senajith B. Rekawa

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IV（2013）

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Key words
extreme ultraviolet lithography,EUV,microscope,actinic,mask,reticle,imaging,zoneplate
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