Dry Development Rinse Process for Ultimate Resolution Improvement Via Pattern Collapse Mitigation

Safak Sayan,Zheng Tao,B. T. Chan,Danilo De Simone,Yuhei Kuwahara,Kathleen Nafus,Michael J. Leeson,Florian Gstrein,Arjun Singh,Geert Vandenberghe

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXII（2015）

Cited 4|Views20

Key words

Dry Development Rinse Process,DDRP,Dry Development Rinse Material,DDRM,Pattern collapse,ultimate resolution,line width roughness,LWR,exposure latitude

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