Electrical and Physical Characterization of Ultrathin Silicon Oxynitride Gate Dielectric Films Formed by the Jet Vapor Deposition TechniqueKaramcheti A.,Watt V. H. C.,Luo T. Y.,Brady D.,Shaapur F.,Vishnubhotla L.,Gale G.,Huff H. R.,Jackson M. D.,Torres K.,Diebold A.,Guan J., Gilmer M. C.,Brown G. A.,Bersuker G.,Zeitzoff P.,Tamagawa T.,Guo X.,Wang X. W.,Ma T. P.MRS Proceedings（1999）引用 1|浏览4AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
