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Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Kevin Cummings,Dominic Ashworth,Mark Bremer, Rodney Chin,Yu-Jen Fan,Luc Girard,Holger Glatzel,Michael Goldstein,Eric Gullikson, Jim Kennon,Bob Kestner,Lou Marchetti,Patrick Naulleau,Regina Soufli, Johannes Bauer,Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen,Stefan Wurm

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2014）

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关键词
EUVL,extreme ultraviolet lithography,high NA
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