氧分压与沉积速率对ITO薄膜性能的影响
Rengong jingti xuebao(2009)
Abstract
本文侧重研究利用电子束蒸发技术制备ITO透明导电薄膜过程中氧分压、沉积速率对其性能的影响.研究发现,随着氧分压的增大,样品透光性和导电性均呈现先增大后减小的趋势;通过计算得出禁带宽度随着氧分压的增大也呈现先增大后减小的趋势.对沉积速率对样品性能的影响进行了研究,结果表明沉积速率降低有利于样品性能的改善.
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