Voltage and Temperature Scalable Gate Delay and Slew Models Including Intra-Gate Variations
21ST INTERNATIONAL CONFERENCE ON VLSI DESIGN HELD JOINTLY WITH THE 7TH INTERNATIONAL CONFERENCE ON EMBEDDED SYSTEMS, PROCEEDINGS(2008)
关键词
global process variation,input edge slew,local process parameter,local process variation,maximum error,slew model,standard cell gate,standard deviation,standard polynomial mod,temperature scal,Intra-Gate Variations,Temperature Scalable Gate Delay
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