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Voltage and Temperature Scalable Gate Delay and Slew Models Including Intra-Gate Variations

21ST INTERNATIONAL CONFERENCE ON VLSI DESIGN HELD JOINTLY WITH THE 7TH INTERNATIONAL CONFERENCE ON EMBEDDED SYSTEMS, PROCEEDINGS(2008)

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关键词
global process variation,input edge slew,local process parameter,local process variation,maximum error,slew model,standard cell gate,standard deviation,standard polynomial mod,temperature scal,Intra-Gate Variations,Temperature Scalable Gate Delay
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