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Research Interests

Papers共 175 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选
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主题
期刊级别
合作者
合作机构
High NA EUV Stitching: Mask Performance is a Key
Natalia V. Davydova,Vincent Wiaux,Nick Pellens,Tatiana Kovalevich, Laura Huddleston,Frank Timmermans, Cyrus Tabery,Joost Bekaert,Lieve van Look,Alberto Colina,Bram Slachter, Nitesh Pandey,Stefan Hunsche,Ataklti Weldeslassie, Guillaume Libeert
Photomask Japan 2024 XXX Symposium on Photomask and Next-Generation Lithography Mask Technology (2024)
Cited0Views0Bibtex
0
0
Aerial Image Metrology (AIMS?) Based Mask-Model Accuracy Improvement for Computational Lithography
N. Pandey,S. Hunsche, A. Lyons, J. Chen,R. la Greca, R. Capelli, G. Kersteen
PHOTOMASK TECHNOLOGY 2022 (2022)
Cited0Views0Bibtex
0
0
Stochastic Defect Criticality Prediction Enabled by Physical Stochastic Modeling and Massive Metrology
ChangAn Wang,Peigen Cao,Maxence Delorme,Jen-Yi Wuu, Jiyou Fu,Fuming Wang, Bob Lin,Yiqiong Zhao, Yi-Hsing Peng,Yongfa Fan,Mu Feng, Bin Cheng,Jen-Shiang Wang, Mark Simmoms,Stefan Hunsche,Oliver Patterson, Kevin Pao,Abdalmohsen Elmalk, Kevin Gao, Ruochong Fei, Xuefeng Zeng, Xiaolong Zhang
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII (2021)
Cited2Views0Bibtex
2
0
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Author Statistics

#Papers: 175

#Citation: 6651

H-Index: 38

G-Index: 78

Sociability: 6

Diversity: 3

Activity: 1

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