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论文共 11 篇作者统计合作学者相似作者

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Curvilinear Data Representation and Its Impact on File Size and Lithographic Performance

Jiuning Hu,Adam Lyons,Chris Spence, Kurt Wampler, Mahmoud Mohsen,Yen-Wen Lu,Rachit Gupta, Youping Zhang,Rafael Howell, Jiyoon Chang, James Moon, Jun Ye

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3no. 1 (2024)

引用2浏览0引用

Computational Lithography Solutions to Support EUV High-Na Patterning

Rongkuo Zhao, Fan Zhou,Jialei Tang, Jeff Lu, Yunbo Liu,Dezheng Sun,Ming-Chun Tien,Stephen Hsu,Rachit Gupta, Youping Zhang,Joerg Zimmermann

DTCO and Computational Patterning II (2023)

引用0浏览0引用

Machine Learning Techniques for OPC Improvement at the Sub-5 Nm Node

Changsoo Kim,Seungjong Lee, Sangwoo Park,No-Young Chung,Jungmin Kim, Narae Bang, Sanghwa Lee,SooRyong Lee,Robert Boone, Pengcheng Li, Jiyoon Chang, Xinxin Zhou, YoungMi Kim, MinSu Oh,Minsung Kim,Rachit Gupta, Jun Ye,Stanislas Baron

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI（2020）

引用7浏览0引用

Full-chip Application of Machine Learning SRAFs on DRAM Case Using Auto Pattern Selection

Kun-yuan Chen,Andy Lan,Richer Yang,Vincent Chen,Shulu Wang,Stella Zhang,Xiangru Xu,Andy Yang,Sam Liu,Xiaolong Shi,Angmar Li,Stephen Hsu,Stanislas Baron,Gary Zhang,Rachit Gupta

OPTICAL MICROLITHOGRAPHY XXXII（2019）

引用5浏览0引用

Freeform Mask Optimization Using Advanced Image Based M3D Inverse Lithography and 3D-NAND Full Chip OPC Application

Yaobin Feng,Zhiyang Song,Moran Guo, Jun He, Longxia Guo, Gang Xu,Sam Liu, Jingjing Liu,Stephen Hsu,Austin Peng,Andy Yang,Rachit Gupta,Junwei Lu,Victor Peng, Jun Wang,Xiaolong Shi, Leon Liu,Rafael Howell,Cuiping Zhang,Zero Li, Ning-ning Jia

OPTICAL MICROLITHOGRAPHY XXXI (2018)

引用4浏览0引用

Two-layer Critical Dimensions and Overlay Process Window Characterization and Improvement in Full-Chip Computational Lithography

John L. Sturtevant,Vlad Liubich,Rachit Gupta

Journal of Micro/Nanolithography MEMS and MOEMS（2016）

引用4浏览0引用

Implementation of Assist Features in Euv Lithography

Fan Jiang,Martin Burkhardt,Ananthan Raghunathan,Andres Torres,Rachit Gupta,James Word

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI（2015）

引用10浏览0引用

Full Chip Two-Layer CD and Overlay Process Window Analysis

Rachit Gupta,Shumay Shang,John Sturtevant

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2015）

引用2浏览0引用

Directed Self-Assembly (dsa) Grapho-Epitaxy Template Generation with Immersion Lithography

Yuansheng Ma,Junjiang Lei,J. Andres Torres,Le Hong,James Word,Germain Fenger,Alexander Tritchkov,George Lippincott,Rachit Gupta,Neal Lafferty,Yuan He,Joost Bekaert,Geert Vandenberghe

Journal of Micro/Nanolithography MEMS and MOEMS（2015）

引用13浏览0引用

Characterization and Mitigation of Relative Edge Placement Errors (repe) in Full-Chip Computational Lithography

John Sturtevant,Rachit Gupta,Shumay Shang,Vlad Liubich,James Word

PHOTOMASK TECHNOLOGY 2015 (2015)

引用3浏览0引用

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