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论文共 34 篇作者统计合作学者相似作者

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ArFi Speckle Reduction and Impact on Local CDU
Will Conley,Stephen Hsu,Michael Crouse, Dylan Martin, Rajasekhar Rao, Natalllia Karlitskaya, Dirk van Leuken,Jan Baselmans,Marieke van Veen, Edwin de Jong, Birgitt Hepp,Rasmus Nielsen, Eric Bakker
Optical and EUV Nanolithography XXXVII (2024)
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Affordable Optical Proximity Correction Runtime for EUV Curvilinear Mask Tape-out Flow
Ping Digaum, Kazuto Kajiwara, Nobue Kosa,Ming-Chuan Yang,Ezequiel Vidal Russell,Jianhong Qiu,Omar Ndiaye,Nicolas Martin, Hesham Omar,Ehsan Kabiri Rahani, Peigen Cao,Michael Crouse
DTCO AND COMPUTATIONAL PATTERNING III (2024)
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A Holistic Approach to Model-Based Stochastic-Aware Computational Lithography
ChangAn Wang,Yongfa Fan,Mu Feng, Qian Xie, Jazer Wang, Christopher Kaplan,Michael Crouse, Xiaoyang Li,Stephen Hsu, Peigen Cao, Yi-Hsing Peng, Stephen Chang, Jun Ye, Youping Zhang, Bin Cheng, Ken Yang, Leiwu Zheng, Jen-Shiang Wang,Austin Peng, Li-Hao Yeh, Cuiping Zhang,Rafael Howell, Alexander Tan, Yiqiong Zhao, Jun Lang, Xiaolong Zhang
Optical and EUV Nanolithography XXXVI (2023)
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Physical Dose Modeling and Throughput Optimization in EUV Computational Lithography
Austin Peng, Christopher Kaplan, Jeff Lu,Michael Crouse, Zuanyi Li, Xiaobo Xie,David Rio, Achim Woessner, Alexander Tan,Cuiping Zhang, Xiaoyang Jason Li,Dezheng Sun,Stephen . Hsu,Rafael C. Howell
Optical and EUV Nanolithography XXXVI (2023)
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A Novel Solution on KrF Pixel Layer with Thick Photo Resist (PR) by Single Exposure Multi-Focal Imaging (SE MFI) Technique
Zhenhai Yao, Lequn Jin, Yuhua Li, Maoqun Jiang,Fabin Huang, Min Fang, Xichen Sheng,Rongkuo Zhao,Michael Crouse,Chris Kaplan,Dongqing Zhang, Dongxiang Shi, Zhonghua Xu, Chaoqun Guo,Pieter Scheijgrond, Xiaoyang Jason Li,Stephen Hsu,Will Conley, Zhen Tang
OPTICAL AND EUV NANOLITHOGRAPHY XXXV (2022)
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作者统计

#Papers: 34

#Citation: 818

H-Index: 12

G-Index: 25

Sociability: 5

Diversity: 2

Activity: 0

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