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Papers共 64 篇Author StatisticsCo-AuthorSimilar Experts

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Nearly Anhydrous Undissociated Hf for the Removal of Hf/Ta/Zr Based Polymers after Plasma Etch, Selectively to Aluminum
M. Cazes,L. Broussous,P. Garnier,C. Pizzetti,L. Gabette,P. Besson
15TH INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR CLEANING SCIENCE AND TECHNOLOGY (SCST 15)no. 2 (2017): 199-209
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#Papers: 64

#Citation: 917

H-Index: 21

G-Index: 28

Sociability: 6

Diversity: 2

Activity: 0

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