His research has included solid state physics, surface physics and chemistry, interfaces, semiconductor materials and processing science and technology, process diagnostics and modeling, manufacturing science, combinatorial materials science, biomaterials and bioMEMS. His semiconductor process research has emphasized the elucidation of chemical and physical mechanisms involved in surface cleaning, thermal oxidation, chemical vapor deposition, and plasma etching, and in pursing these directions he pioneered the exploitation of ultrahigh vacuum process environments and their integration with in-situ surface and interface diagnostics.