Christopher N. Anderson

Christopher N. Anderson received his BS degree from the University of California, Davis and his MS degree from the University of Arizona, both in the field of Optical Engineering. He is currently pursuing a PhD at the University of California, Berkeley with research focused on several aspects related to the advancement of EUV lithography. He is also currently exploring novel and innovative applications for coherent and incoherent soft x-ray/EUV radiation in metrology, holography, and imaging.