Anne Lauwers - Silicon Process Technology, IMEC

基本信息

Career Trajectory

Bio

Anne Lauwers received the M.S. degree in electrical engineering and the Ph.D. degree from the Katholieke Universiteit Leuven, Leuven, Belgium, in 1990 and 1995, respectively. Since 1995, she has been with the Interuniversity Microelectronics Center, Leuven, where she is active in the research and development of silicides for advanced CMOS technologies. She is the author or a coauthor of more than 100 publications.

Research Interests

Papers共 151 篇Author StatisticsCo-AuthorSimilar Experts

By YearBy Citation主题筛选期刊级别筛选合作者筛选合作机构筛选

New Carbon-Based Thermal Stability Improvement Technique for Niptsi Used in Cmos Technology

C. Ortolland,M. Togo,E. Rosseel,S. Mertens,J. Kittl,P. P. Absil,A. Lauwers,T. Hoffmann

MICROELECTRONIC ENGINEERINGno. 5 (2011): 578-582

Cited8Views0EIBibtex

High Yield Sub-0.1Μm2 6T-SRAM Cells, Featuring High-K/metal-gate Finfet Devices, Double Gate Patterning, a Novel Fin Etch Strategy, Full-Field EUV Lithography and Optimized Junction Design & Layout

2010 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERSpp.23-24, (2010)

Cited14Views0EIWOSBibtex

Semiconductor device with reduced diffusion of workfunction modulating element

Hongyu Yu,Shouzen Chang,J A Kittl,A Lauwers,Anabela Veloso

mag（2010）

Cited24Views0Bibtex

Electrical Demonstration of Thermally Stable Ni Silicides on Si1−xCx Epitaxial Layers

V. Machkaoutsan,P. Verheyen,M. Bauer, Y. Zhang,S. Koelling,A. Franquet,K. Vanormelingen,R. Loo,C. S. Kim,A. Lauwers,N. Horiguchi,C. Kerner,T. Hoffmann,E. Granneman,W. Vandervorst,P. Absil,S. G. Thomas

Microelectronic Engineeringno. 3 (2009): 306-310

Cited7Views0EIBibtex

Single-Metal Dual-Dielectric (SMDD) Gate-First CMOS Integration Towards Low VT and High Performance

L-A Ragnarsson,T. Schram,E. Rohr,F. Sebaai, P. Kelkar, M. Wada,T. Kauerauf,M. Aoulaiche,M. J. Cho,S. Kubicek,A. Lauwers,T. Y. Hoffmann,P. P. Absil,S. Biesemans

PROCEEDINGS OF TECHNICAL PROGRAM 2009 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLIC...（2009）

Cited2Views0EIWOSBibtex

First-In-Class Drugs with Neuroprotective Potential Against Parkinson'S Disease Identified Through Biology-Driven Discovery Approach

T. Van Dooren, K. Coupet,E. Gomme,H. Duhamel,A. Lauwers, E. Cuveliers,K. Princen, I. Bastiaens,J. Winderickx,V. Rojas de la Parra,I. Van der Auwera,S. Wera,G. Griffioen

Parkinsonism & Related Disorders（2009）

Cited7Views0Bibtex

Silicide Yield Improvement with NiPtSi Formation by Laser Anneal for Advanced Low Power Platform CMOS Technology

C. Ortolland,E. Rosseel,N. Horiguchi,C. Kerner,S. Mertens,J. Kittl,E. Verleysen,H. Bender,W. Vandervost,A. Lauwers,P. P. Absil,S. Biesemans,S. Muthukrishnan, S. Srinivasan,A. J. Mayur,R. Schreutelkamp,T. Hoffmann

2009 IEEE INTERNATIONAL ELECTRON DEVICES MEETING（2009）

Cited25Views0EIWOSBibtex

Carbon-based Thermal Stabilization Techniques for Junction and Silicide Engineering for High Performance CMOS Periphery in Memory Applications

C. Ortolland,S. Mathew,R. Duffy, K. Saino,C. S. Kim,S. Mertens,N. Horiguchi,C. Vrancken,T. Chiarella,C. Kerner,P. P. Absil,A. Lauwers,S. Biesemans,T. Hoffmann

ULIS 2009 10TH INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION OF SILICON（2009）

Cited5Views0EIWOSBibtex

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